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|
| 1 |
8,445,360 |
Method for manufacturing semiconductor device
|
| 2 |
8,366,515 |
Form transfer grinding method
|
| 3 |
8,357,028 |
Self-bonded foamed abrasive articles and machining with such articles
|
| 4 |
8,348,724 |
Polishing pad manufacturing method
|
| 5 |
8,348,723 |
Structured abrasive article and method of using the same
|
| 6 |
8,337,276 |
Automated detection of characteristics of abrasive products during use
|
| 7 |
8,303,378 |
Polishing pad, polishing method and method of forming polishing pad
|
| 8 |
8,303,375 |
Polishing pads for chemical mechanical planarization and/or other
polishing methods
|
| 9 |
8,231,433 |
Polishing method and polishing apparatus
|
| 10 |
8,226,455 |
Vacuum-assisted sanding block
|
| 11 |
8,216,026 |
Form transfer grinding method
|
| 12 |
8,210,904 |
Slurryless mechanical planarization for substrate reclamation
|
| 13 |
8,202,334 |
Method of forming silicate polishing pad
|
| 14 |
8,172,648 |
Chemical-mechanical planarization pad
|
| 15 |
8,147,294 |
Capillary, capillary polishing method, and capillary polishing apparatus
|
| 16 |
8,118,897 |
Mix head assembly for forming chemical mechanical polishing pads
|
| 17 |
8,092,280 |
Glass substrate for magnetic disk and method for producing the same
|
| 18 |
8,083,570 |
Chemical mechanical polishing pad having sealed window
|
| 19 |
8,075,372 |
Polishing pad with microporous regions
|
| 20 |
8,066,551 |
Retaining ring with shaped surface
|
| 21 |
8,062,097 |
Grinding surfaces of workpieces
|
| 22 |
8,038,512 |
Glass substrate for information recording medium and method for
manufacturing same
|
| 23 |
8,038,508 |
Apparatus for polishing a wafer and method for detecting a polishing end
point by the same
|
| 24 |
8,025,557 |
Sanding clay
|
| 25 |
7,976,361 |
Polishing apparatus and polishing method
|
| 26 |
7,976,358 |
Polishing apparatus and polishing method
|
| 27 |
7,967,660 |
Polishing apparatus and polishing method
|
| 28 |
7,966,743 |
Micro-structured drying for inkjet printers
|
| 29 |
7,959,496 |
Flexible membrane assembly for a CMP system and method of using
|
| 30 |
7,959,495 |
Method and apparatus for finishing the surface of rubber covered rollers
|
| 31 |
7,959,493 |
Method for polishing glass substrate and process for producing glass
substrate
|
| 32 |
7,959,492 |
Disk-shaped substrate inner circumference polishing method
|
| 33 |
7,950,983 |
Retainer ring
|
| 34 |
7,947,098 |
Method for manufacturing chemical mechanical polishing pad polishing
layers having reduced gas inclusion defects
|
| 35 |
7,922,564 |
Sanding element
|
| 36 |
7,918,713 |
Tribological surface and lapping method and system therefor
|
| 37 |
7,892,073 |
Bowling ball abrader and polisher system and method
|
| 38 |
7,892,071 |
Orthopaedic component manufacturing method and equipment
|
| 39 |
7,892,070 |
Process of using a polishing apparatus including a platen window and a
polishing pad
|
| 40 |
7,871,309 |
Polishing pad
|
| 41 |
7,867,060 |
Retainer ring used for polishing a structure for manufacturing magnetic
head, and polishing method using the same
|
| 42 |
7,854,646 |
Substrate polishing apparatus and substrate polishing method
|
| 43 |
7,815,492 |
Surface treatment method
|
| 44 |
7,775,855 |
Sanding tool with rotatable handle
|
| 45 |
7,771,251 |
Three-dimensional network for chemical mechanical polishing
|
| 46 |
7,753,760 |
Apparatus and method for polishing drill bits
|
| 47 |
7,744,445 |
Polishing apparatus and polishing method
|
| 48 |
7,740,521 |
Polishing head, polishing apparatus and polishing method for semiconductor
wafer
|
| 49 |
7,736,215 |
Polishing tool and polishing method and apparatus using same
|
| 50 |
7,670,210 |
Tool for working on a surface
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